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dc.contributor.authorShin, Yongjoon-
dc.contributor.authorShin, Subin-
dc.contributor.authorSung, Dongchul-
dc.contributor.authorCha, Janghwan-
dc.contributor.authorChoi, Hyeong-Kyu-
dc.contributor.authorJeong, Yunjo-
dc.contributor.authorIm, Min Ji-
dc.contributor.authorKim, Yang Hui-
dc.contributor.authorAhn, Seokhoon-
dc.contributor.authorBae, Sukang-
dc.contributor.authorLim, Joonwon-
dc.contributor.authorHan, Edmund-
dc.contributor.authorHuang, Pinshane Y.-
dc.contributor.authorvan der Zande, Arend M.-
dc.contributor.authorHong, Suklyun-
dc.contributor.authorLee, Gwan-Hyoung-
dc.contributor.authorSon, Jangyup-
dc.date.accessioned2025-05-11T05:30:22Z-
dc.date.available2025-05-11T05:30:22Z-
dc.date.created2025-05-07-
dc.date.issued2025-07-
dc.identifier.issn0169-4332-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/152400-
dc.languageEnglish-
dc.publisherElsevier BV-
dc.titleFacilitated fluorination and etching of 2D materials (vol 645, 158857, 2024)-
dc.typeArticle-
dc.identifier.doi10.1016/j.apsusc.2025.163053-
dc.description.journalClass1-
dc.identifier.bibliographicCitationApplied Surface Science, v.698-
dc.citation.titleApplied Surface Science-
dc.citation.volume698-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid001470524800001-
dc.identifier.scopusid2-s2.0-105001555576-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeCorrection-
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