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dc.contributor.authorYeon, Eungbeom-
dc.contributor.authorWoo, Seungwan-
dc.contributor.authorMo, Jeongeun-
dc.contributor.authorHong, Sukkyu-
dc.contributor.authorSon, Hoki-
dc.contributor.authorLee, In-Hwan-
dc.contributor.authorJung, Dae hwan-
dc.contributor.authorChoi, Won Jun-
dc.date.accessioned2026-03-09T05:00:04Z-
dc.date.available2026-03-09T05:00:04Z-
dc.date.created2026-03-09-
dc.date.issued2026-03-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/154408-
dc.description.abstractSWIR optoelectronics has attracted attention for the potential applications such as laser radar, chemical sensing, and atmospheric window systems. Among suitable diodes for SWIR applications, Sb-based laser diodes (LDs) are ideal candidates due to their high-power efficiency, low threshold current density, and high-temperature stability. This work reports the low-threshold current density SWIR LD via detailed growth optimization of active region, which consists of InGaAsSb quaternary quantum wells (QWs). Firstly, optimal QWs growth temperature of 450 °C, a V/III ratio of 5, and an Sb cracker temperature of 700 °C for In0.24Ga0.76Sb QWs are identified with photoluminescence (PL) measurement. The optimized structure exhibited strong PL emission of ∼2.1 μm wavelength at room-temperature. As a result, the low-threshold current density SWIR InGaAsSb double-QWs LDs show a threshold current density of 125 A/cm², and a lasing spectrum of 2.08 μm, without AR/HR coatings and p-side down mounting. These LDs show diode performance comparable to state-of-the-art devices in terms of threshold current density. These results highlight the critical role of detailed growth control of QW active region in realizing low-threshold current density SWIR LDs.-
dc.languageEnglish-
dc.publisherElsevier BV-
dc.titleLow-threshold SWIR GaSb-based MQW laser diodes enabled by optimized growth of active region-
dc.typeArticle-
dc.identifier.doi10.1016/j.mtcomm.2026.114943-
dc.description.journalClass1-
dc.identifier.bibliographicCitationMaterials Today Communications, v.52-
dc.citation.titleMaterials Today Communications-
dc.citation.volume52-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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KIST Article > 2026
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