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Issue Date | Title | Author(s) |
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1997-11 | Characteristics of a-Si:H films prepared by ECR CVD as a function of the H-2/SiH4 | Kang, MS; Kim, JY; Koo, YS; Lim, TH; Oh, IW; Jeon, BJ; Jung, IY; An, C |
1997-11 | The characteristics before and after annealing of amorphous silicon films prepared by ECR plasma CVD | Kang, M; Kim, J; Lim, T; Oh, I; Jeon, B; Jung, I; An, C |
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Jeon, B
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Jeon, BJ
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Jung, I
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Jung, IY
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Kang, M
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Kang, MS
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Kim, J
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Kim, JY
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Koo, YS
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Lim, T