Full metadata record

DC Field Value Language
dc.contributor.authorJeong, In ho-
dc.contributor.authorKyungjune, Cho-
dc.contributor.authorSeobin Yun-
dc.contributor.authorJiwon Shin-
dc.contributor.authorJaeyoung Kim-
dc.contributor.authorGyu Tae Kim-
dc.contributor.authorTakhee Lee-
dc.contributor.author정승준-
dc.date.accessioned2024-01-12T03:31:32Z-
dc.date.available2024-01-12T03:31:32Z-
dc.date.created2022-06-07-
dc.date.issued2022-04-
dc.identifier.issn1936-0851-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/76747-
dc.description.abstractSurface charge transfer doping (SCTD) has been regarded as an effective approach to tailor the electrical characteristics of atomically thin transition metal dichalcogenides (TMDs) in a nondestructive manner due to their twodimensional nature. However, the difficulty of achieving rationally controlled SCTD on TMDs via conventional doping methods, such as solution immersion and dopant vaporization, has impeded the realization of practical optoelectronic and electronic devices. Here, we demonstrate controllable SCTD of molybdenum disulfide (MoS2) field-effect transistors using inkjet-printed benzyl viologen (BV) as an n-type dopant. By adjusting the BV concentration and the areal coverage of inkjet-printed BV dopants, controllable SCTD results in BV-doped MoS2 FETs with elaborately tailored electrical performance. Specifically, the suggested solvent system creates well-defined droplets of BV ink having a volume of similar to 2 pL, which allows the high spatial selectivity of SCTD onto the MoS2 channels by depositing the BV dopant on demand. Our inkjetprinted SCTD method provides a feasible solution for achieving controllable doping to modulate the electrical and optical performances of TMD-based devices.-
dc.languageEnglish-
dc.publisherAmerican Chemical Society-
dc.titleTailoring the Electrical Characteristics of MoS2 FETs through Controllable Surface Charge Transfer Doping Using Selective Inkjet Printing-
dc.typeArticle-
dc.identifier.doi10.1021/acsnano.2c00021-
dc.description.journalClass1-
dc.identifier.bibliographicCitationACS Nano, v.16, no.4, pp.6215 - 6223-
dc.citation.titleACS Nano-
dc.citation.volume16-
dc.citation.number4-
dc.citation.startPage6215-
dc.citation.endPage6223-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000813149700001-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusTRANSITION-METAL DICHALCOGENIDES-
dc.subject.keywordPlusFEW-LAYER MOS2-
dc.subject.keywordPlusREDUCTION-
dc.subject.keywordPlusVIOLOGEN-
dc.subject.keywordPlusWS2-
dc.subject.keywordAuthormolybdenum disulfide-
dc.subject.keywordAuthorchemical doping-
dc.subject.keywordAuthorsurface charge transfer doping-
dc.subject.keywordAuthorinkjet printing-
dc.subject.keywordAuthorfield-effect transistor-
Appears in Collections:
KIST Article > 2022
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE