Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Pietryga, J.M. | - |
dc.contributor.author | Baea, W.K. | - |
dc.contributor.author | Parka, Y.-S. | - |
dc.contributor.author | Robel, I. | - |
dc.contributor.author | Klimov, V.I. | - |
dc.date.accessioned | 2024-01-12T06:53:36Z | - |
dc.date.available | 2024-01-12T06:53:36Z | - |
dc.date.created | 2022-03-07 | - |
dc.date.issued | 2015-05 | - |
dc.identifier.issn | 1938-5862 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/80278 | - |
dc.description.abstract | Despite tremendous progress since the first demonstration of QDbased light-emitting diodes (QD-LEDs) there is substantial room for improvement in performance, particularly at high current densities. Here we analyze the role of Auger recombination in the performance of QD-LEDs by conducting a systematic characterization of device performance in conjunction with timeresolved spectroscopic studies of photoexcited carriers directly within the device structure. We use a series of structurally engineered core/shell QDs that exhibit very similar single-exciton properties, but distinctly different rates of non-radiative Auger recombination to show that both QD-LED efficiency and the onset for efficiency roll-off are strongly influenced by Auger recombination. Finally, we demonstrate that device efficiency can be improved by either reducing Auger recombination rates, or by improving charge-injection balance, both of which can be accomplished through engineering of the QD structure. ? 2014 by The Electrochemical Society. | - |
dc.language | English | - |
dc.publisher | Electrochemical Society Inc. | - |
dc.title | Improving the performance of quantum dot light-emitting diodes through nanoscale engineering | - |
dc.type | Conference | - |
dc.identifier.doi | 10.1149/06105.0075ecst | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 4 - 225th ECS Meeting, pp.75 - 85 | - |
dc.citation.title | International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 4 - 225th ECS Meeting | - |
dc.citation.startPage | 75 | - |
dc.citation.endPage | 85 | - |
dc.citation.conferencePlace | US | - |
dc.citation.conferencePlace | Orlando, Florida | - |
dc.citation.conferenceDate | 2015-05-11 | - |
dc.relation.isPartOf | ECS Transactions | - |
dc.identifier.scopusid | 2-s2.0-84925081666 | - |
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