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dc.contributor.authorMin, B.-C.-
dc.contributor.authorShin, I.-J.-
dc.contributor.authorChoi, G.-M.-
dc.contributor.authorAhn, C.-
dc.contributor.authorLanger, J.-
dc.contributor.authorOcker, B.-
dc.contributor.authorMaass, W.-
dc.contributor.authorShin, K.-H.-
dc.date.accessioned2024-01-12T07:21:32Z-
dc.date.available2024-01-12T07:21:32Z-
dc.date.created2022-03-07-
dc.date.issued2010-08-
dc.identifier.issn0000-0000-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/80831-
dc.description.abstractWe illuminate how the tunnel magnetoresistance (TMR) of MgO-based magnetic tunnel junctions (MTJs) is affected by the structure, materials, and fabrication processes. First, we demonstrate a possibility to control detrimental diffusions by separating a step for obtaining a grain-to-grain epitaxy in CoFeB/MgO/CoFeB layers from a step for achieving a high exchange-bias field in the pinned layer. A high TMR and large exchange-bias field can be obtained simultaneously by circumventing Mn diffusion and minimizing Ru diffusion during the annealing process at high temperature. Second, we show that the MTJs consisting of CoFeB/ MgO/ CoFeB/ Ru/ ferromagnet (FM), where FM is Co, Ni, NiFe, CoFe, or CoFeB, can provide a reasonably high TMR and decent thermal stability, presumably useful for the memory applications. ?2010 IEEE.-
dc.languageEnglish-
dc.publisherIEEE-
dc.titleMgO-based magnetic tunnel junctions for spin-transfer-torque random access memory-
dc.typeConference-
dc.identifier.doi10.1109/NANO.2010.5697730-
dc.description.journalClass1-
dc.identifier.bibliographicCitation2010 10th IEEE Conference on Nanotechnology, NANO 2010, pp.144 - 147-
dc.citation.title2010 10th IEEE Conference on Nanotechnology, NANO 2010-
dc.citation.startPage144-
dc.citation.endPage147-
dc.citation.conferencePlaceKO-
dc.citation.conferencePlaceIlsan, Gyeonggi-Do-
dc.citation.conferenceDate2010-08-17-
dc.relation.isPartOf2010 10th IEEE Conference on Nanotechnology, NANO 2010-
dc.identifier.scopusid2-s2.0-79951824886-
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KIST Conference Paper > 2010
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