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dc.contributor.authorSon, Jeong Gon-
dc.date.accessioned2024-01-12T08:17:15Z-
dc.date.available2024-01-12T08:17:15Z-
dc.date.created2022-01-14-
dc.date.issued2005-05-30-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/82041-
dc.publisherNANO Systems Institute (NSI)-
dc.titlePerpendicular Orientation of Block Copolymer Thin Films Using Various Treatments-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationThe 1st International Workshop of NANO Systems Institute (IW-NSI)-
dc.citation.titleThe 1st International Workshop of NANO Systems Institute (IW-NSI)-
dc.citation.conferencePlaceKO-
dc.citation.conferencePlace서울대학교 호암교수회관 컨벤션 센터-
dc.citation.conferenceDate2005-05-30-
dc.relation.isPartOfInternational Workshop of NANO Systems Institute (IW-NSI)-
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KIST Conference Paper > 2005
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