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dc.contributor.author김동준-
dc.contributor.author김용태-
dc.date.accessioned2024-01-12T08:36:38Z-
dc.date.available2024-01-12T08:36:38Z-
dc.date.issued2000-01-08-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/82254-
dc.titleTaSiNx확산　방지막의　제조방법과 그를　이용한　반도체　소자의　접촉접합및　다층금속　배선-
dc.typePatent-
dc.date.registration2000-01-08-
dc.date.application1997-11-04-
dc.identifier.patentRegistrationNumber250954-
dc.identifier.patentApplicationNumber97-57884-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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