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고분자　물질을　이용한　유전체　후막　제조　방법

Author

제해준; 김병국

Assignee

한국과학기술연구원

Regitration Date

2003-03-28

Registration No.

379771

Application Date

2000-10-16

Application No.

00-58962

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/84669

Appears in Collections:

KIST Patent > 2000

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