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dc.contributor.authorKim, Yong Tae-
dc.date.accessioned2024-01-12T10:41:54Z-
dc.date.available2024-01-12T10:41:54Z-
dc.date.created2022-01-14-
dc.date.issued1999-03-28-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/84944-
dc.titleCharacteristics of SrBi2Ta2O9 thin films grown by MOCVD using a new stontium tantalum ethoxide (Sr[Ta(OEt)6]2) source-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation, pp.0-
dc.citation.startPage0-
dc.citation.endPage0-
dc.relation.isPartOf제 46회 응용물리학관계연합강연회-
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