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Characteristics of SrBi2Ta2O9 thin films grown by MOCVD using a new stontium tantalum ethoxide (Sr[Ta(OEt)6]2) source

Authors

Kim, Yong Tae

Issue Date

1999-03-28

Citation

, pp.0

URI

https://pubs.kist.re.kr/handle/201004/84944

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KIST Conference Paper > Others

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