DSpace at KISTKIST Patent2022

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dc.contributor.author강종윤-
dc.contributor.author한수덕-
dc.contributor.author김진상-
dc.contributor.author백승협-
dc.contributor.author허성훈-
dc.contributor.author김성근-
dc.contributor.author송현철-
dc.contributor.author윤정호-
dc.contributor.author장지수-
dc.contributor.author최지원-
dc.date.accessioned2024-01-12T11:06:00Z-
dc.date.available2024-01-12T11:06:00Z-
dc.date.issued2023-03-13-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/85274-
dc.title결정 희생층의 자가 확산 방식으로 도핑된 고결정 산화물 박막과 그 제조 방법-
dc.typePatent-
dc.date.registration2023-03-13-
dc.date.application2022-06-21-
dc.identifier.patentRegistrationNumber10-2510607-0000-
dc.identifier.patentApplicationNumber10-2022-0075738-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2022
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