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나노여과분리막의 표면 개질 방법

Author

이영행; 뉴엔 티 투 후옹; 이수관

Assignee

한국과학기술연구원

Regitration Date

2022-01-17

Registration No.

10-2353615

Application Date

2020-05-29

Application No.

10-2020-0064969

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/85645

Appears in Collections:

KIST Patent > 2020

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