DSpace at KISTKIST Patent2019

Full metadata record

DC Field Value Language
dc.contributor.author강구민-
dc.contributor.author한일기-
dc.contributor.author김춘근-
dc.contributor.author김영환-
dc.contributor.author고형덕-
dc.contributor.author권석준-
dc.date.accessioned2024-01-12T11:35:24Z-
dc.date.available2024-01-12T11:35:24Z-
dc.date.issued2021-03-30-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/85797-
dc.title특정 파장의 광원 및 반응성 가스를 이용하여 대상물의 표면을 평탄화하는 방법 및 장치-
dc.typePatent-
dc.date.registration2021-03-30-
dc.date.application2019-02-08-
dc.identifier.patentRegistrationNumber10964550-
dc.identifier.patentApplicationNumber16/270594-
dc.publisher.countryUS-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
Appears in Collections:
KIST Patent > 2019
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Simple Item Record

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE