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dc.contributor.authorJu, Byeong Kwon-
dc.contributor.authorKim, Seong-Jin-
dc.contributor.authorLee, Yun Hi-
dc.contributor.authorPark, Beom Soo-
dc.contributor.authorBaik, Young-Joon-
dc.contributor.authorLim, Sungkyoo-
dc.contributor.authorOh, Myung Hwan-
dc.date.accessioned2024-01-12T11:38:57Z-
dc.date.available2024-01-12T11:38:57Z-
dc.date.created2022-03-07-
dc.date.issued1996-07-
dc.identifier.issn0000-0000-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/85923-
dc.description.abstractDiamond-tip field emitter arrays and a flat diamond films were fabricated and characterized. The tip radius of 300 angstroms was obtained by using a silicon mold formed by orientation dependent etching (ODE). The fabricated diamond-tip array was identified as diamond from Raman spectroscopy. Emission current of 200 μA and threshold voltage of 600 V were obtained for the diamond-tip field emitter arrays from the current-voltage measurement. Emission current of 6 μA and threshold voltage of 800 V were obtained from the flat diamond film deposited under the same condition as diamond-tip field emitter arrays. The diamond-tip field emitter arrays were shown to have better electrical characteristics than the flat diamond films.-
dc.languageEnglish-
dc.publisherIEEE-
dc.titleCharacterization of CVD diamond film and diamond-tip field emitter array for FED applications-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation1996 9th International Vacuum Microelectronics Conference, IVMC, pp.530 - 533-
dc.citation.title1996 9th International Vacuum Microelectronics Conference, IVMC-
dc.citation.startPage530-
dc.citation.endPage533-
dc.citation.conferencePlaceUS-
dc.citation.conferencePlaceSt.Petersburg, Russia-
dc.citation.conferenceDate1996-07-07-
dc.relation.isPartOfProceedings of the IEEE International Vacuum Microelectronics Conference, IVMC-
dc.identifier.scopusid2-s2.0-0030365115-
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KIST Conference Paper > Others
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