KIST Library Institutional Repository

형태학적　조절을　이용한　고성능　선택투과성을　가지는　열방성　액정고분자　복합　기체분리막

Author

서용석; 김광웅; 홍성욱; 황승상; 홍순만

Assignee

한국과학기술연구원

Regitration Date

2002-06-05

Registration No.

341293

Application Date

1999-12-20

Application No.

99-59282

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/88141

Appears in Collections:

KIST Patent > Others

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