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dc.contributor.authorMOON BYUNGHYUCK-
dc.contributor.authorYong Soo Kim-
dc.contributor.authorKim, Yong Tae-
dc.contributor.authorHamin Sung-
dc.contributor.authorJomsool Kim-
dc.contributor.authorByeong-Kwon Ju-
dc.contributor.authorJhon, Young Min-
dc.date.accessioned2024-01-12T14:06:07Z-
dc.date.available2024-01-12T14:06:07Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/88854-
dc.languageEnglish-
dc.publisher11.8~11, 교토-
dc.subjectEUV-
dc.subjectHigh Harmonic Generation-
dc.subjectMask Inspection-
dc.titleActinic EUV Mask Inspection using Coherent EUV Light from High Harmonic Generation-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationInternational Microprocesses and Nanotechnology Conference 2016, v.11P-11-1-
dc.citation.titleInternational Microprocesses and Nanotechnology Conference 2016-
dc.citation.volume11P-11-1-
dc.citation.conferencePlaceJA-
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