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dc.contributor.authorKim Yong Soo-
dc.contributor.authorPark June-
dc.contributor.author성하민-
dc.contributor.author김점술-
dc.contributor.author이승범-
dc.contributor.author조현우-
dc.contributor.authorPark, Min-Chul-
dc.contributor.authorCho, Woon Jo-
dc.contributor.authorKim, Yong Tae-
dc.contributor.author이주한-
dc.contributor.authorJhon, Young Min-
dc.date.accessioned2024-01-12T15:34:43Z-
dc.date.available2024-01-12T15:34:43Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/90468-
dc.languageEnglish-
dc.subjectCSM-
dc.subjectCoherent-
dc.subjectEUV-
dc.subjectMask Inspection-
dc.subjectCD Measurement-
dc.titleCD Measurements of EUV Mask using a Coherent Scattering Microscope Mask Inspection Tool-
dc.title.alternativeCSM 마스크 검사장비를 이용한 EUV 마스크의 CD 측정-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation차세대 리소그래피 학술대회, v.W-II-7, pp.189 - 190-
dc.citation.title차세대 리소그래피 학술대회-
dc.citation.volumeW-II-7-
dc.citation.startPage189-
dc.citation.endPage190-
dc.citation.conferencePlaceKO-
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