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dc.contributor.authorJin Chang Kyu-
dc.contributor.authorDo Kyung Hwang-
dc.contributor.authorTae-Whan Kim-
dc.contributor.authorKyung-Kon Kim-
dc.contributor.authorCHOI, WON-KOOK-
dc.date.accessioned2024-01-12T16:04:45Z-
dc.date.available2024-01-12T16:04:45Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/91094-
dc.languageEnglish-
dc.subjectSiOxNy barrier film-
dc.subjectflexible organic photovoltaic-
dc.subjectplasma enhanced chemical vapor deposition-
dc.titleFabrication of SiOxNy barrier film for flexible organic photovoltaic by plasma enhanced chemical vapor deposition-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationInternational Conference on Microelectronics and Plasma Technology 2014-
dc.citation.titleInternational Conference on Microelectronics and Plasma Technology 2014-
dc.citation.conferencePlaceKO-
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