KIST Library Institutional Repository

Strain-relaxed SiGe layer on Si formed by PIII&D technology

Authors

HAN, SEUNG HEE; Moon Sun Woo; Kim Sungmin; Kim Kyeong-Hun

Citation

The 12th International Workshop on PBIID

Keywords

plasma immersion ion implantation; plasma; ion implantation; strain-relaxed SiGe; SiGe; Non-gaseous plasma immersion ion implantation; HiPIMS

URI

https://pubs.kist.re.kr/handle/201004/93370

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML