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dc.contributor.authorCho Jung-gyn-
dc.contributor.authorCho Sung-jin-
dc.contributor.authorPark, Min-Chul-
dc.contributor.authorJhon, Young Min-
dc.contributor.authorByeong-Kwon Ju-
dc.contributor.authorJung-Young Son-
dc.date.accessioned2024-01-12T18:34:09Z-
dc.date.available2024-01-12T18:34:09Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/93834-
dc.languageEnglish-
dc.subjectNoise-
dc.subjectReduction-
dc.subjectMask-
dc.subjectInspection-
dc.subjectEUVL-
dc.subjectphase retrieval-
dc.subjectdust-
dc.subjectnoise reduction-
dc.subjectimage enhancement-
dc.titleEnhancement of Reconstructed Image by Noise Reduction for Mask Inspection of EUVL (Extreme Ultra-Violet Light) Lithography-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationProceeding of Euro-American Workshop on Information Optics, pp.1 - 2-
dc.citation.titleProceeding of Euro-American Workshop on Information Optics-
dc.citation.startPage1-
dc.citation.endPage2-
dc.citation.conferencePlaceFI-
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