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Enhancement of Reconstructed Image by Noise Reduction for Mask Inspection of EUVL (Extreme Ultra-Violet Light) Lithography

Authors

Cho Jung-gyn; Cho Sung-jin; Park, Min-Chul; Jhon, Young Min; Byeong-Kwon Ju; Jung-Young Son

Citation

Proceeding of Euro-American Workshop on Information Optics, pp.1 - 2

Keywords

Noise; Reduction; Mask; Inspection; EUVL; phase retrieval; dust; noise reduction; image enhancement

URI

https://pubs.kist.re.kr/handle/201004/93834

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KIST Conference Paper > Others

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