Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim Ki Hyuk | - |
| dc.contributor.author | Cho Jung-gyn | - |
| dc.contributor.author | Park, Min-Chul | - |
| dc.contributor.author | Ju, Byeong-Kwon | - |
| dc.contributor.author | Cho Sung-jin | - |
| dc.contributor.author | Son, Jung-Young | - |
| dc.date.accessioned | 2024-01-12T18:35:41Z | - |
| dc.date.available | 2024-01-12T18:35:41Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/93957 | - |
| dc.language | English | - |
| dc.subject | extreme ultraviolet lithography | - |
| dc.subject | mask inspection | - |
| dc.subject | stereoscopic | - |
| dc.subject | microscopy | - |
| dc.title | Coherent scattering stereoscopic microscopy for mask inspection of extreme ultra-violet lithography | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | SPIE Defense Security and Sensing | - |
| dc.citation.title | SPIE Defense Security and Sensing | - |
| dc.citation.conferencePlace | US | - |
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