DSpace at KISTKIST Patent2019

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dc.contributor.author옥명렬-
dc.contributor.author박지민-
dc.contributor.author김유찬-
dc.contributor.author석현광-
dc.contributor.author박지헌-
dc.contributor.author전호정-
dc.contributor.author서현선-
dc.contributor.author정가영-
dc.contributor.author박종웅-
dc.contributor.author한형섭-
dc.date.accessioned2024-01-12T19:30:22Z-
dc.date.available2024-01-12T19:30:22Z-
dc.date.issued2021-05-11-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/94682-
dc.title활성산소 종의 발생속도가 제어되는 임플란트 및 이를 이용한 활성산소 종의 발생 제어 방법-
dc.typePatent-
dc.date.registration2021-05-11-
dc.date.application2019-06-05-
dc.identifier.patentRegistrationNumber10-2252691-
dc.identifier.patentApplicationNumber10-2019-0066915-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2019
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