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dc.contributor.authorOH SUNGYOUN-
dc.contributor.authorChoi Seung-Sock-
dc.contributor.author이희승-
dc.contributor.authorHwang, Seung Sang-
dc.contributor.authorhyung-min choi-
dc.contributor.authorBaek Kyung Youl-
dc.date.accessioned2024-01-12T20:37:27Z-
dc.date.available2024-01-12T20:37:27Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/96326-
dc.languageEnglish-
dc.titleSynthesis and Characterization of a F-containing Polysilsesquioxane for Low-k Interlayer Dielectric Application-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국 고분자 추계 학술대회-
dc.citation.title한국 고분자 추계 학술대회-
dc.citation.conferencePlaceKO-
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