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Synthesis and Characterization of a F-containing Polysilsesquioxane for Low-k Interlayer Dielectric Application

Authors

OH SUNGYOUN; Choi Seung-Sock; 이희승; Hwang, Seung Sang; hyung-min choi; Baek Kyung Youl

Citation

한국 고분자 추계 학술대회

URI

https://pubs.kist.re.kr/handle/201004/96326

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KIST Conference Paper > Others

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