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dc.contributor.authorJung Da Woon-
dc.contributor.authorChong Eu Gene-
dc.contributor.authorKim Seung Han-
dc.contributor.authorChun Yoon Soo-
dc.contributor.authorLee Sang Yeol-
dc.date.accessioned2024-01-12T23:06:07Z-
dc.date.available2024-01-12T23:06:07Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/99047-
dc.languageEnglish-
dc.titleThe characteristics changing of HfInZnO TFT with process conditions by RF sputter-
dc.title.alternative스퍼터를 이용한 공정 조건에 따른 HfInZnO TFT 특성변화-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국전기전자재료학회 추계학술대회, pp.34-
dc.citation.title한국전기전자재료학회 추계학술대회-
dc.citation.startPage34-
dc.citation.endPage34-
dc.citation.conferencePlaceKO-
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