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dc.contributor.authorLee Seung-min-
dc.contributor.authorBaik, Young Joon-
dc.contributor.authorLee, Wook Seong-
dc.contributor.authorTae-Yeon Seong-
dc.contributor.authorJONG-KEUK, PARK-
dc.date.accessioned2024-01-12T23:07:00Z-
dc.date.available2024-01-12T23:07:00Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/99111-
dc.languageEnglish-
dc.subjectcBN-
dc.subjectgradient layer-
dc.subjectadhesion-
dc.subjectB4C-
dc.subjectsputtering-
dc.titleEffect of gradient buffer layer prepared with different substrate bias on the adhesion of cBN film deposited by R.F. magnetron sputtering with B4C target and unipolar pulsed D.C. substrate bias-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation10th APCPST (Asia Pacific Conference on Plasma Science and Technology)-
dc.citation.title10th APCPST (Asia Pacific Conference on Plasma Science and Technology)-
dc.citation.conferencePlaceKO-
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