Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 고석근 | - |
dc.contributor.author | 조정 | - |
dc.contributor.author | 최원국 | - |
dc.contributor.author | 정형진 | - |
dc.date.accessioned | 2024-01-13T00:02:29Z | - |
dc.date.available | 2024-01-13T00:02:29Z | - |
dc.date.issued | 2005-01-11 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/99933 | - |
dc.title | 이온빔을 이용한 재료의 표면 처리 장치 | - |
dc.type | Patent | - |
dc.date.registration | 2005-01-11 | - |
dc.date.application | 2001-09-21 | - |
dc.identifier.patentRegistrationNumber | 6,841,789 | - |
dc.identifier.patentApplicationNumber | 09/957,896 | - |
dc.publisher.country | US | - |
dc.type.iprs | 특허 | - |
dc.contributor.assignee | 한국과학기술연구원 | - |
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