Showing results 1 to 2 of 2
Issue Date | Title | Author(s) |
---|---|---|
- | Simulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects | Vaibhav K. Andleigh; PARK YOUNG JOON; Carl V. Thompson |
- | ULSI interconnect failures due to electromigration-induced stress evolution: computer simulation study | PARK YOUNG JOON; Vaibhav K. Andleigh; Carl V. Thompson; 최인석; 주영창 |