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ULSI interconnect failures due to electromigration-induced stress evolution: computer simulation study

Authors

PARK YOUNG JOON; Vaibhav K. Andleigh; Carl V. Thompson; 최인석; 주영창

Citation

Proc. of the 6th Workshop on Atomic-migration and Stress-induced Phenomena in ULSI Metallizations, pp.19 - 22

Keywords

electromigration; computer simulation

URI

https://pubs.kist.re.kr/handle/201004/108259

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KIST Conference Paper > Others

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