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Showing results 1 to 4 of 4

Issue DateTitleAuthor(s)
1992-01A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitorAhn, K.-D.; Kang, J.-H.; Kim, S.-J.; Park, B.-S.; Park, C.-E.; Park, C.-G.
1994-01SYNTHESIS AND POLYMERIZATIONS OF N-(TERT-BUTOXY)MALEIMIDE AND APPLICATION OF ITS POLYMERS AS A CHEMICAL AMPLIFICATION RESISTAHN, KD; KOO, DI
1991-01t-BOC maleimide copolymers for thermally stable deep UV resists by chemical amplificationAhn, K.-D.; Koo, D.-I.; Kim, S.-J.
1994-01Terpolymers of tosyloxymaleimide for application as a polymeric photoacid generator in single-component resists.안광덕; 구덕일; 정찬문
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