Showing results 1 to 2 of 2
| Issue Date | Title | Author(s) | 
|---|---|---|
| - | Simulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects | Vaibhav K. Andleigh; PARK YOUNG JOON; Carl V. Thompson | 
| - | ULSI interconnect failures due to electromigration-induced stress evolution: computer simulation study | PARK YOUNG JOON; Vaibhav K. Andleigh; Carl V. Thompson; 최인석; 주영창 |