2009-06 | Atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing | Shin, J. W.; Lee, J. Y.; No, Y. S.; Kim, T. W.; Choi, W. K. |
2007-04-30 | Atomic arrangement variations of [0001]-tilt grain boundaries in ZnO thin films grown on p-Si substrates due to thermal treatment | Shin, J. W.; Lee, J. Y.; No, Y. S.; Jung, J. H.; Kim, T. W.; Choi, W. K. |
2006-09-04 | Correlation between the atomic structures and the misorientation angles of [0001]-tilt grain boundaries at triple junctions in ZnO thin films grown on Si substrates | Shin, J. W.; Lee, J. Y.; No, Y. S.; Kim, T. W.; Choi, W. K. |
2007-03 | Effect of thermal annealing on the formation of preferential c-axis orientation and an interfacial layer for ZnO thin films grown on an n-Si (001) substrate | Yuk, J. M.; Shin, J. W.; Lee, J. Y.; Son, D. I.; Jung, J. H.; Kim, T. W.; Kim, J. Y.; Choi, W. K. |
2011-06-15 | Effects of different annealing atmospheres on the surface and microstructural properties of ZnO thin films grown on p-Si (100) substrates | Shin, J. W.; No, Y. S.; Lee, J. Y.; Kim, J. Y.; Choi, W. K.; Kim, T. W. |
2006-07-01 | Effects of thermal treatment on the formation of the columnar structures in ZnO thin films grown on p-Si(100) substrates | Shin, J. W.; Lee, J. Y.; No, Y. S.; Kim, T. W.; Choi, W. K. |
2008-10 | Formation and Microstructural Properties of Locally Distributed ZnSiO3 Nanoparticles Embedded in a SiO2 Layer by Using a Focused Electron Beam | Shin, J. W.; No, Y. S.; Kim, T. W.; Choi, W. K. |
2011-02 | Formation mechanisms of ZnO nanocrystals embedded in an amorphous Zn2xSi1-xO2 layer due to sputtering and annealing | Shin, J. W.; Lee, J. Y.; No, Y. S.; Kim, T. W.; Choi, W. K. |
2009-02-18 | Irradiation-induced shrinkage and expansion mechanisms of SiO2 circle membrane nanopores | Shin, J. W.; Lee, J. Y.; Lee, D. U.; Oh, D. H.; Kim, D. H.; Kim, T. W.; Cho, W. J.; Jin, S. |
2008-07-23 | The formation mechanism of periodic Zn nanocrystal arrays embedded in an amorphous layer by rapid electron beam irradiation | Shin, J. W.; Lee, J. Y.; No, Y. S.; kim, T. W.; Choi, W. K.; Jin, S. |