Formation and Microstructural Properties of Locally Distributed ZnSiO3 Nanoparticles Embedded in a SiO2 Layer by Using a Focused Electron Beam

Authors
Shin, J. W.No, Y. S.Kim, T. W.Choi, W. K.
Issue Date
2008-10
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.8, no.10, pp.5566 - 5570
Abstract
Locally distributed crystalline ZnSiO3 nanoparticles embedded in a SiO2 layer inserted between the ZnO thin film and the Si substrate were formed using transmission electron microscopy (TEM) with a focused electron beam irradiation process. High-resolution TEM (HRTEM) images and energy dispersive X-ray spectroscopy (EDS) profiles showed that ZnSiO3 nanocrystals with a size of approximately 6 nm were formed in the SiO2 layer. The formation mechanisms of the ZnSiO3 nanocrystals in the SiO2 layer are described on the basis of the HRTEM images and the EDS profiles.
Keywords
STIMULATED DESORPTION; TRANSISTORS; STIMULATED DESORPTION; TRANSISTORS; ZnSiO3 Nanocrystal; ZnO Thin Film; Si Substrate; Focused Electron Beam; Nanocrystal Formation Mechanism
ISSN
1533-4880
URI
https://pubs.kist.re.kr/handle/201004/133096
DOI
10.1166/jnn.2008.1349
Appears in Collections:
KIST Article > 2008
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