Formation and Microstructural Properties of Locally Distributed ZnSiO3 Nanoparticles Embedded in a SiO2 Layer by Using a Focused Electron Beam
- Authors
- Shin, J. W.; No, Y. S.; Kim, T. W.; Choi, W. K.
- Issue Date
- 2008-10
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.8, no.10, pp.5566 - 5570
- Abstract
- Locally distributed crystalline ZnSiO3 nanoparticles embedded in a SiO2 layer inserted between the ZnO thin film and the Si substrate were formed using transmission electron microscopy (TEM) with a focused electron beam irradiation process. High-resolution TEM (HRTEM) images and energy dispersive X-ray spectroscopy (EDS) profiles showed that ZnSiO3 nanocrystals with a size of approximately 6 nm were formed in the SiO2 layer. The formation mechanisms of the ZnSiO3 nanocrystals in the SiO2 layer are described on the basis of the HRTEM images and the EDS profiles.
- Keywords
- STIMULATED DESORPTION; TRANSISTORS; STIMULATED DESORPTION; TRANSISTORS; ZnSiO3 Nanocrystal; ZnO Thin Film; Si Substrate; Focused Electron Beam; Nanocrystal Formation Mechanism
- ISSN
- 1533-4880
- URI
- https://pubs.kist.re.kr/handle/201004/133096
- DOI
- 10.1166/jnn.2008.1349
- Appears in Collections:
- KIST Article > 2008
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