Atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing
- Authors
- Shin, J. W.; Lee, J. Y.; No, Y. S.; Kim, T. W.; Choi, W. K.
- Issue Date
- 2009-06
- Publisher
- CAMBRIDGE UNIV PRESS
- Citation
- JOURNAL OF MATERIALS RESEARCH, v.24, no.6, pp.2006 - 2010
- Abstract
- High-resolution transmission electron microscopy (HRTEM) images of annealed ZnO thin-films showed the domain boundaries of a (01 (1) over bar0) plane with a transition zone and a (01 (1) over bar1) plane without a transition zone. The 30 degrees in-plane rotation domain boundaries were formed in the ZnO thin films because the angle of the c-axis was tilted 3.5 degrees in comparison with that of neighboring 30 degrees in-plane rotation domains to reduce the misfit strain energy. The atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing are described.
- Keywords
- ELECTRONIC-STRUCTURE; SAPPHIRE; EPITAXY; ELECTRONIC-STRUCTURE; SAPPHIRE; EPITAXY; domain boundary; ZnO; Si; thermal annealing
- ISSN
- 0884-2914
- URI
- https://pubs.kist.re.kr/handle/201004/132451
- DOI
- 10.1557/JMR.2009.0233
- Appears in Collections:
- KIST Article > 2009
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