Threshold voltage shift of solution processed InGaZnO thin film transistors with indium composition ratio

Other Titles
용액 공정으로 제작된 InGaZnO TFT의 인듐 조성비에 따른 문턱전압 변화
Authors
Park ki hoLee Deuk-HeeDong Yun LeeByeong-Kwon JuLee Sang Yeol
Citation
전기전자재료학회 하계학술대회, pp.3
Keywords
threshold voltage (Vth); indium-gallium-zinc oxide (IGZO); thin film transistors (TFTs)
URI
https://pubs.kist.re.kr/handle/201004/100176
Appears in Collections:
KIST Conference Paper > Others
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