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dc.contributor.authorLee Seung-min-
dc.contributor.authorTae-Yeon Seong-
dc.contributor.authorJONG-KEUK, PARK-
dc.date.accessioned2024-01-13T02:00:51Z-
dc.date.available2024-01-13T02:00:51Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/101145-
dc.languageEnglish-
dc.subjecta-Si-
dc.subjectsputtering-
dc.subjectcrystallization-
dc.subjectthin film-
dc.titleCrystallization behavior of amorphous silicon thin film deposited by DC/RF magnetron sputtering with substrate bias-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAEPSE2009-
dc.citation.titleAEPSE2009-
dc.citation.conferencePlaceKO-
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