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A Novel Al-Reflow Process Using Surface Modification by the ECR Plasma Treatment and Its Application to the 256Mbit DRAM

Authors

Park, In Seon; Lee, Sang In; Wee Young Jin; Jung, Woo Sang; Choi, Gil Hyeon; Park, Chang Soo; Park, Seon Hoo; Ahn, Sung Tae; Lee, Moon Yong; Y.K. Kim; R. Reynolds

Citation

Electron Devices Meeting, 1994, Technical Digest., International, pp.109 - 112

Keywords

Al-Reflow; ECR Plasma Treatment; Contact filling; 256Mbit DRAM

URI

https://pubs.kist.re.kr/handle/201004/102744

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KIST Conference Paper > Others

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