Pulse Plasma Assisted Atomic Layer deposition 장치의 제작과 특성

Authors
Kim, Yong TaePark Ji Ho김희준이창우
Issue Date
2005-09
Citation
한국 반도체 및 디스플레이 장비 학회 2005년도 추계학술대회
URI
https://pubs.kist.re.kr/handle/201004/104759
Appears in Collections:
KIST Conference Paper > Others
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