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dc.contributor.authorKwon Young Suk-
dc.contributor.authorSHIN, SUN IL-
dc.contributor.authorKIM IK SOO-
dc.contributor.authorKim, Seong Il-
dc.contributor.authorKim, Yong Tae-
dc.contributor.authorIn-Hoon Choi-
dc.date.accessioned2024-01-13T10:03:09Z-
dc.date.available2024-01-13T10:03:09Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/105558-
dc.languageEnglish-
dc.titleEtch stop Process of SrBi2Ta2O9 thin film using CeO2 buffer layer for self aligned ferroelectric gate structure-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationThe 12th Seoul International Symposium on the Physics of Semiconductors and Applications-2004, pp.174-
dc.citation.titleThe 12th Seoul International Symposium on the Physics of Semiconductors and Applications-2004-
dc.citation.startPage174-
dc.citation.endPage174-
dc.citation.conferencePlaceKO-
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