Etch stop Process of SrBi2Ta2O9 thin film using CeO2 buffer layer for self aligned ferroelectric gate structure

Authors
Kwon Young SukSHIN, SUN ILKIM IK SOOKim, Seong IlKim, Yong TaeIn-Hoon Choi
Citation
The 12th Seoul International Symposium on the Physics of Semiconductors and Applications-2004, pp.174
URI
https://pubs.kist.re.kr/handle/201004/105558
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KIST Conference Paper > Others
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