Development of Etch Stop Process by Using Selective Dry Etching of SrBi2Ta2O9/Y2O3

Authors
SHIN, SUN ILKwon Young SukKim, Seong IlKim, Yong TaeJung Ho Park
Citation
The 11th Korean Conference on Semiconductors, v.2, pp.449 - 450
URI
https://pubs.kist.re.kr/handle/201004/105566
Appears in Collections:
KIST Conference Paper > Others
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