Thermal treatment of InGaAs/GaAs self-assembled quantum dots with PECVD-grown SiO₂ capping layer

Authors
S. H. HwangShin, Jae CheolChoi, Won JunY. M. ParkSONG, JIN-DONGPark, Young JuHan, Il KiCho, Woon JoLee, Jung IlJ. W. Choe
Citation
2003 IEEE International Conference on Plasma Science, pp.427
Keywords
quantum dot; dielectric capping; thermal treatment
URI
https://pubs.kist.re.kr/handle/201004/105927
Appears in Collections:
KIST Conference Paper > Others
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