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Improvement of W-N diffusion barrier on silicon dioxide using pulse plasma atomic layer deposition

Authors

Hyun Sang Sim; Hyeongtag Jeon; Kim, Seong Il; Kim, Yong Tae

Citation

The 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Mate, pp.211

URI

https://pubs.kist.re.kr/handle/201004/105954

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KIST Conference Paper > Others

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