DSpace at KIST: Gas cluster ion source for etching and smoothing of solid surfaces.

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DC Field	Value	Language
dc.contributor.author	송재훈	-
dc.contributor.author	CHOI DUCK KYUN	-
dc.contributor.author	CHOI WON-KOOK	-
dc.date.accessioned	2024-01-13T12:32:18Z	-
dc.date.available	2024-01-13T12:32:18Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/106836	-
dc.language	English	-
dc.subject	cluster ion impact	-
dc.subject	gas cluster	-
dc.subject	etching	-
dc.subject	smoothing	-
dc.subject	ITO	-
dc.subject	Si	-
dc.title	Gas cluster ion source for etching and smoothing of solid surfaces.	-
dc.title.alternative	고체 표면 식각 및 평탄화를 위한 가스 클러스터 이온원 개발 =	-
dc.type	Conference	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	한국전기전자재료학회 2002 년도 하계학술대회 논문집, pp.232 - 234.	-
dc.citation.title	한국전기전자재료학회 2002 년도 하계학술대회 논문집	-
dc.citation.startPage	232	-
dc.citation.endPage	234.	-
dc.citation.conferencePlace	KO	-

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