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Gas cluster ion source for etching and smoothing of solid surfaces.

Other Titles

고체 표면 식각 및 평탄화를 위한 가스 클러스터 이온원 개발 =

Authors

송재훈; CHOI DUCK KYUN; CHOI WON-KOOK

Citation

한국전기전자재료학회 2002 년도 하계학술대회 논문집, pp.232 - 234.

Keywords

cluster ion impact; gas cluster; etching; smoothing; ITO; Si

URI

https://pubs.kist.re.kr/handle/201004/106836

Appears in Collections:

KIST Conference Paper > Others

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