DSpace at KISTKIST Conference PaperOthers

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dc.contributor.author임근식-
dc.contributor.author최훈상-
dc.contributor.author이종한-
dc.contributor.authorKim Yong Tae-
dc.contributor.authorKim Seong Il-
dc.contributor.author최인훈-
dc.date.accessioned2024-01-13T13:03:10Z-
dc.date.available2024-01-13T13:03:10Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/107157-
dc.languageEnglish-
dc.titleStructural and electrical characteristics of ZrO ₂ as a gate dielectric and buffer layer grown by RF magnetron sputtering-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAVS 49th International Symposium, Colorado Convention Center Denver-
dc.citation.titleAVS 49th International Symposium, Colorado Convention Center Denver-
dc.citation.conferencePlaceUS-
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