KIST Library Institutional Repository

Structural and electrical characteristics of ZrO ₂ as a gate dielectric and buffer layer grown by RF magnetron sputtering

Authors

임근식; 최훈상; 이종한; Kim Yong Tae; Kim Seong Il; 최인훈

Citation

AVS 49th International Symposium, Colorado Convention Center Denver

URI

https://pubs.kist.re.kr/handle/201004/107157

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML