KIST Library Institutional Repository

Synthesis and application of a new Ti precursor, Ti(MPD)(MDOP) ₂ for the metal-organic chemical vapor deposition of TiO ₂ thin films

Authors

Woo Kyoungja; 홍성호; 이완인

Citation

The Second Asian Conference on Chemical Vapor Deposition, pp.219 - 221

Keywords

Ti precursor

URI

https://pubs.kist.re.kr/handle/201004/107629

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML